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e.three. “Superconductive” electromagnets and solenoids, “specifically built” to be fully charged or discharged in lower than 1 second and getting all of the subsequent:
ECCN 3C908 controls “Fluorides, hydrides, chlorides, of silicon or germanium” that contains a specified share of silicon or germanium isotopes. ECCN 3C909 controls “Silicon, silicon oxides, germanium or germanium oxides” containing a specified percentage of silicon or germanium isotopes. Isotopic enriched Si and Ge are exported with certificates which suggest isotopic distribution or blend, no matter their chemical kinds, by professional practice. Individuals paperwork would facilitate examination of regardless of whether isotopic purity in the exported item is below or earlier mentioned the control threshold.
technological Note: for that uses of 3A001.i, a `50 percent-wave voltage' (`Vπ') may be the applied voltage needed to create a section alter of a hundred and eighty degrees while in the wavelength of light propagating through the optical modulator.
Anisotropic dry etching is usually useful for self-aligned contact and bare minimum pitch by means of etching. Polysilicon dummy gate patterning, and its removal in the Replacement steel Gate (RMG) course of action for FinFETs and GAAFET, can also be enabled by anisotropic etching. hugely selective isotropic/anisotropic etching is routinely used in multi-patterning purposes like really hard-mask.
License specifications for deemed exports and considered reexports for countrywide security and regional security controls are discussed in part G of the rule, because the license demands are identical for both equally.
NP relates to “technology” for commodities controlled by 3A001, 3A201, or 3A225 to 3A234 for NP causes
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h. Multi-layer masks which has a period change layer not specified by 3B001.g and intended ( print web site 72950) to be website used by lithography tools possessing a mild supply wavelength less than 245 nm; Notice: 3B001.
The report will have to incorporate details usually included in a deemed export license software, see suggestions for considered export license purposes underneath the master and aid tab on the BIS Web-site at .
3. For “numerous channel ADCs”, the “sample rate” isn't aggregated and also the “sample level” is the most level of any one channel.
Anisotropic dry etching is important for GAAFET and equivalent 3D framework fabrication. It's also a very important Software for Fin-shaped industry influence Transistor (FinFET) fabrication. As taller and straighter fins are expected for scaling, anisotropic dry etching is utilized by FinFET producers to uniformly scale the significant dimension of the Fin, increasing its profile and therefore maximizing its effectiveness.
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f. “Technology” for the application of inorganic overlay coatings or inorganic surface modification coatings (specified in column three of the following desk) to non-Digital substrates (specified in column two of the subsequent desk), by processes specified in column 1 of the following table and outlined during the Technical Notice.